[A-1-4] Boron Segregation to {311} Defects Induced by Self-Implantation Damage in Si

Jianxin Xia, Tomoya Saito, Ryangsu Kim, Takenori Aoki, Yoshinari Kamakura, Kenji Taniguchi (1.Department of Electronics and Information Systems, Osaka University)

https://doi.org/10.7567/SSDM.1998.A-1-4