[A-1-4] Boron Segregation to {311} Defects Induced by Self-Implantation Damage in Si

Jianxin Xia、Tomoya Saito、Ryangsu Kim、Takenori Aoki、Yoshinari Kamakura、Kenji Taniguchi (1.Department of Electronics and Information Systems, Osaka University)

https://doi.org/10.7567/SSDM.1998.A-1-4