[A-2-2] Self-Limiting Atomic-Layer Selective Deposition of Silicon Nitride by Temperature-Controlled Method

Kenji Ooba, Yoshimitsu Nakashima, Anri Nakajima, Shin Yokoyama (1.Research Center for Nanodevices and Systems, Hiroshima University)

https://doi.org/10.7567/SSDM.1998.A-2-2