[A-4-5] Atomic-Scale Structure of SiO2/Si(001) Interface Formed by Furnace Oxidation

Noriyuki Miyata、Heiji Watanabe、Masakazu Ichikawa (1.Joint Research Center for Atom Technology, Angstrom Technology Partnership (JRCAT-ATP) c/o National Institute for Advanced Interdisciplinary Research (NAIR))

https://doi.org/10.7567/SSDM.1998.A-4-5