[A-5-3] Non-Destructive Characterization of Electronic Properties of Pre- and Post-Processing Silicon Surfaces by UHV Contactless Capacitance-Voltage Method

Toshiyuki Yoshida, Tamotsu Hashizume, Hideki Hasegawa, Takamasa Sakai (1.Research Center for Interface Quantum Electronics, and Graduate School of Electronics and Information Engineering, Hokkaido University, 2.Dainippon Screen Manufacturing Co., Ltd.)

https://doi.org/10.7567/SSDM.1998.A-5-3