[B-2-2] Chemica Vapor Deposition of Ru and Its Application in (Ba, Sr)TiO3 Capacitors for Future DRAM

Tomonori Aoyama, Masahiro Kiyotoshi, Soichi Yamazaki, Kazuhiro Eguchi (1.Microelectronics Engineering Laboratory, Toshiba Corporation)

https://doi.org/10.7567/SSDM.1998.B-2-2