[B-2-3] Electrical Properties of (Ba, Sr)TiO3 Films on Ru Bottom Electrodes Prepared by ECR Plasma CVD at Extremely Low Temperature and RTA

Shuji SONE、Reiko AKAHANE、Koji ARITA、Hisato YABUTA、Shintaro YAMAMICHI、Masaji YOSHIDA、Yoshitake KATO (1.ULSI Device Development Laboratories, NEC Corporation、2.Fundamental Research Laboratories, NEC Corporation)

https://doi.org/10.7567/SSDM.1998.B-2-3