[B-6-2] Analysis of Buried-Oxide Dielectric Breakdown Mechanism in Low-Dose SIMOX Structures

Keisuke KAWAMURA、Takayuki YANO、Isao HAMAGUCHI、Seiji TAKAYAMA、Yoichi NAGATAKE、Atsuki MATSUMURA (1.Advanced Technology Research Laboratories, Nippon Steel Corporation)

https://doi.org/10.7567/SSDM.1998.B-6-2