[C-9-5] High Temperature Reactive Ion Etching of GaN and AlGaN Using Cl2 and CH4 Plasma

Durga Basak、Kenji Yamashita、Tomoya Sugahara、Daisuke Nakagawa、Tao Wang、Katsushi Nishino、Shiro Sakai (1.Satellite Venture Business Laboratory Department of Electrical and Electronic Engineering The University of Tokushima)

https://doi.org/10.7567/SSDM.1998.C-9-5