[D-2-2] Noticeable Enhancement of Edge Effect in Short Channel Characteristics of Trench-Isolated MOSFETs

Toshiyuki Oishi、Katsuomi Shiozawa、Akihiko Furukawa、Yuji Abe、Yasunori Tokuda (1.Advanced Technology R&D Center, Mitsubishi Electric Corporation)

https://doi.org/10.7567/SSDM.1998.D-2-2