[D-4-6] Digital Etching of InP Using Tris-Dimethylaminophosphorus in Ultra-High Vacuum

Nobuyuki Otsuka、Jun-ichi Nishizawa、Yutaka Oyama、Hideyuki Kikuchi、Ken Suto (1.Telecommunications Advancement Organization of Japan, SENDAI Research Center、2.Semiconductor Research Institute of Semiconductor Research Foundation、3.Dep. Materials Science and Engineering, Graduate School of Engineering, Tohoku University)

https://doi.org/10.7567/SSDM.1998.D-4-6