[D-9-2] Incorporation of N into Si/SiO2 Interfaces: Molecular Orbital Calculations for Evaluating Interface Strain and Heat of Reaction

Jiro Ushio、Takuya Maruizumi、Masanobu Miyao (1.Central Research Laboratory, Hitachi, Ltd.)

https://doi.org/10.7567/SSDM.1998.D-9-2