[A-11-3] Optical Characterization of Gate Oxide Charging Damage by Photoreflectance Spectroscopy

Masashi Agata、Hideo Wada、Osamu Maida、Koji Eriguchi、Akira Fujimoto、Takeshi Kanashima、Masanori Okuyama (1.Area of Materials and Device Physics, Department of Physical Science, Graduate School of Engineering Science, Osaka University、2.ULSI Process Tech. Dev. Ctr., Matsushita Electronics、3.Dept. Electrical Engineering, Wakayama National College of Technology)

https://doi.org/10.7567/SSDM.1999.A-11-3