The Japan Society of Applied Physics

[A-6-2] Source/Drain Extension-to-Gate Overlap Scaling in Deep Sub-Micron MOSFETs

A. Inani、H. Deshpande、S. Krishnan、M.-R. Lin、Jason C. S. Woo (1.Department of Electrical Engineering, University of California、2.Technology Development Group, Advanced Micro Devices)

https://doi.org/10.7567/SSDM.1999.A-6-2