[B-14-2] Two-Dimensional Dopant Profiling of nMOSFETs with Shallow-Extensions Using Electrochemical Etching Technique

Yorinobu Kunimune、Naoharu Nishio、Akira Mineji、Kensuke Yamaguchi、Hiroaki Kikuchi (1.ULSI Device Development Laboratory, NEC Corporation)

https://doi.org/10.7567/SSDM.1999.B-14-2