[B-2-1] Oxide Mediated Solid Phase Epitaxy (OMSPE) of Silicon: A New Low Temperature Epitaxy Technique Using Intentionally Grown Native Oxide

I. Mizushima、Y. Mitani、K. Miyano、S. Kambayashi (1.Microelectronics Engineering Laboratory, R&D Center, Toshiba Corporation)

https://doi.org/10.7567/SSDM.1999.B-2-1