[B-3-3] Impact of Nitrogen Profile in Gate Oxynitride on CMOS Characteristics

Yasuyuki Tamura、Mayumi Shigeno、Satoshi Okubo、Kiyoshi Irino、Toshiro Nakanishi、Kanetake Takasaki (1.ULSI Technology Labs., Fujitsu Laboratories Ltd.)

https://doi.org/10.7567/SSDM.1999.B-3-3