[B-6-1] Highly Reliable Dual Gate Oxide Fabrication by Reducing Wet Etching Time and Re-Oxidation for Sub-Quarter Micron CMOS Devices

Ihl Hyun Cho, Key Min Lee, Hong Goo Choi, Sang Hyuk Park, Seok-Woo Lee, Nag Kyun Sung, Hae Wang Lee, Jae-Gyung Ahn, Yun Jun Huh, Dong Kyun Sohn, Dae Kwan Kang, Jin Won Park (1.R&D Division, LG Semicon. Co., Ltd.)

https://doi.org/10.7567/SSDM.1999.B-6-1