[B-7-1] Intergrity of Gate Oxides Irradiated Under Electron-Beam Lithography Conditions

Pei Fen Chong、Byung Jin Cho、Eng Fong Chor、Moon Sig Joo、In Seok Yeo (1.Department of Electrical Engineering, National University of Singapore、2.Hyundai Electronics Industries Company Limited, Semiconductor Advanced Research Division)

https://doi.org/10.7567/SSDM.1999.B-7-1