[C-8-3] MOCVD Preparation of Epitaxial SBT Films and Their Properties

Katsuyuki Ishikawa、Atsushi Saiki、Keisuke Saito、Hiroshi Fuankubo (1.Department of Innovative and Engineered Materials, Tokyo Institute of Technology、2.Research Cooperation Section, Tokyo Institute of Technology、3.Application Laboratory, Analytical Department, Philips Japan, ltd)

https://doi.org/10.7567/SSDM.1999.C-8-3