[D-4-3] Effect of Oxidation-Induced Strain on Potential Profile in Si SETs Using Pattern-Dependent Oxidation (PADOX)

Seiji Horiguchi, Masao Nagase, Kenji Shiraishi, Hiroyuki Kageshima, Yasuo Takahashi, Katsumi Murase (1.NTT Basic Research Laboratories)

https://doi.org/10.7567/SSDM.1999.D-4-3