[A-1-6] Aluminum Chemical Vapor Deposition Technology for High Deposition Rate and Surface Morphology Improvement

Chang-Hun Lee, Takamasa Nishimura, Kazuya Masu, Kazuo Tsubouchi (1.Research Institute of Electrical Communication, Tohoku University)

https://doi.org/10.7567/SSDM.2000.A-1-6