[A-1-6] Aluminum Chemical Vapor Deposition Technology for High Deposition Rate and Surface Morphology Improvement

Chang-Hun Lee、Takamasa Nishimura、Kazuya Masu、Kazuo Tsubouchi (1.Research Institute of Electrical Communication, Tohoku University)

https://doi.org/10.7567/SSDM.2000.A-1-6