[A-3-1] Influence of Lattice Distortion and Oxygen Defects in BST Films for Memory Capacitors

Noburu Fukushima、Kazuhide Abe、Shoko Niwa、Tomonori Aoyama、Masahiro Kiyotoshi、Souichi Yamazaki、Mitsuaki Izuha、Kazuhiro Eguchi、Katsuhiko Hieda、Tunetoshi Arikado (1.Corporate Research and Development Center, Toshiba Corporation、2.Microelectronics Engineering Laboratory, Semiconductor Company, Toshiba Corporation)

https://doi.org/10.7567/SSDM.2000.A-3-1