[A-5-1] Ultra-Thin Silicon Oxynitride Film Grown at Low-Temperature by Microwave-Excited High-Density Kr/O2/N2 Plasma

Kazuo Ohtsubo, Yuji Saito, Katsuyuki Sekine, Masaki Hiramaya, Shigetoshi Sugawa, Herzl Aharoni, Tadahiro Ohmi (1.Department of Electronic Engineering, Graduate School of Engineering, Tohoku University, 2.At leave from the Department of Electrical and Computer Engineering, Ben-Gurion University, 3.New Industry Creation Hatchery Center, Tohoku University)

https://doi.org/10.7567/SSDM.2000.A-5-1