[A-5-2] High Performance NMOS Devices Using Ultra-Thin VHP Oxynitride

T. Y. Luo、H. N. Al-Shareef、A. Karamcheti、V. H. C. Watt、G. A. Brown、M. D. Jackson、H. R. Huff、B. Evans、D. L. Kwong (1.International Sematech, Inc.、2.University of Texas at Austin、3.Gasonics International)

https://doi.org/10.7567/SSDM.2000.A-5-2