[A-5-2] High Performance NMOS Devices Using Ultra-Thin VHP Oxynitride

T. Y. Luo, H. N. Al-Shareef, A. Karamcheti, V. H. C. Watt, G. A. Brown, M. D. Jackson, H. R. Huff, B. Evans, D. L. Kwong (1.International Sematech, Inc., 2.University of Texas at Austin, 3.Gasonics International)

https://doi.org/10.7567/SSDM.2000.A-5-2