[A-5-4] Novel Nitrogen Profile Control Technology in Ultra Thin Gate Oxide for Deep Submicron CMOS

T. Ogura, H. Kotaki, S. Kakimoto, S. Zaima, Y. Yasuda (1.Advanced Technology Research Laboratories, Sharp Corporation, 2.Center for Co-operative Research in Advanced Science and Technology, Nagoya University, 3.Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University)

https://doi.org/10.7567/SSDM.2000.A-5-4