[A-5-4] Novel Nitrogen Profile Control Technology in Ultra Thin Gate Oxide for Deep Submicron CMOS

T. Ogura、H. Kotaki、S. Kakimoto、S. Zaima、Y. Yasuda (1.Advanced Technology Research Laboratories, Sharp Corporation、2.Center for Co-operative Research in Advanced Science and Technology, Nagoya University、3.Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University)

https://doi.org/10.7567/SSDM.2000.A-5-4