[A-6-1] Precise CD-Controlled Gate Etching Using UHF-ECR Plasma

Masahito Mori, Naoshi Itabashi, Hiroaki Ishimura, Hiroshi Akiyama, Takashi Fujii, Go Saito, Motohiko Yoshigai, Masayuki Kojima, Keiji Okamoto, Kazunori Tsujimoto, Shin'ichi Tachi (1.Central Research Laboratory, Hitachi, Ltd., 2.Kasado Semiconductor Equipment Product Division, Hitachi, Ltd., 3.Hitachi Techno Eng. Co., Ltd., 4.Semiconductor & Integrated Circuit Division, Hitachi, Ltd., 5.Hitachi ULSI Systems Co. Ltd.)

https://doi.org/10.7567/SSDM.2000.A-6-1