[A-6-1] Precise CD-Controlled Gate Etching Using UHF-ECR Plasma

Masahito Mori、Naoshi Itabashi、Hiroaki Ishimura、Hiroshi Akiyama、Takashi Fujii、Go Saito、Motohiko Yoshigai、Masayuki Kojima、Keiji Okamoto、Kazunori Tsujimoto、Shin'ichi Tachi (1.Central Research Laboratory, Hitachi, Ltd.、2.Kasado Semiconductor Equipment Product Division, Hitachi, Ltd.、3.Hitachi Techno Eng. Co., Ltd.、4.Semiconductor & Integrated Circuit Division, Hitachi, Ltd.、5.Hitachi ULSI Systems Co. Ltd.)

https://doi.org/10.7567/SSDM.2000.A-6-1