[A-6-3] Perfectly Etching Uniformity Control of Various Doped Oxide Films Using an Anhydrous HF Gas

Hiroshi Arakawa、Yasuyuki Shirai、Tadahiro Ohmi (1.New Industry Creation Hatchery Center (NICHe), Tohoku University)

https://doi.org/10.7567/SSDM.2000.A-6-3