[A-6-3] Perfectly Etching Uniformity Control of Various Doped Oxide Films Using an Anhydrous HF Gas
Hiroshi Arakawa, Yasuyuki Shirai, Tadahiro Ohmi
(1.New Industry Creation Hatchery Center (NICHe), Tohoku University)
https://doi.org/10.7567/SSDM.2000.A-6-3
