The Japan Society of Applied Physics

[A-8-2] Investigation of ALIVH R Substrate for High Frequency Application

Tadashi Nakamura、Shinobu Kokufu、Naoki Okazaki、Yutaka Taguchi、Daizo Andoh (1.Device Engineering Development Center, Matsushita Electric Industrial Co., Ltd.、2.Corporate Components Development Center, Matsushita Electronic Components Co., Ltd.)

https://doi.org/10.7567/SSDM.2000.A-8-2