[B-1-2] Quantitative Understanding of Electron Mobility Limited by Coulomb Scattering in MOSFETs with N2O and NO Oxynitrides
Takamitsu Ishihara, Shin-ichi Takagi, Masaki Kondo
(1.Advanced LSI Thechnology Laboratory, Research and Development center, Toshiba corporation, 2.Semiconductor company, System LSI Division, Toshiba corporation)
https://doi.org/10.7567/SSDM.2000.B-1-2