[B-1-2] Quantitative Understanding of Electron Mobility Limited by Coulomb Scattering in MOSFETs with N2O and NO Oxynitrides

Takamitsu Ishihara、Shin-ichi Takagi、Masaki Kondo (1.Advanced LSI Thechnology Laboratory, Research and Development center, Toshiba corporation、2.Semiconductor company, System LSI Division, Toshiba corporation)

https://doi.org/10.7567/SSDM.2000.B-1-2