[B-1-2] Quantitative Understanding of Electron Mobility Limited by Coulomb Scattering in MOSFETs with N2O and NO Oxynitrides

Takamitsu Ishihara, Shin-ichi Takagi, Masaki Kondo (1.Advanced LSI Thechnology Laboratory, Research and Development center, Toshiba corporation, 2.Semiconductor company, System LSI Division, Toshiba corporation)

https://doi.org/10.7567/SSDM.2000.B-1-2