[B-6-2] The Polarity Dependence of Soft-Breakdown Characterization for Ultra-Thin Gate Oxides Affected by Nitrogen and Fluorine

Chao. Sung. Lai、T. S. Chao (1.Department of Electronic Engineering, Chang Gung University、2.National Nano Device Laboratory)

https://doi.org/10.7567/SSDM.2000.B-6-2