[B-6-6] Gate Oxide Reliability Concern Associated with X-Ray Lithography

Byung Jin Cho、Sun Jung Kim、Chew Hoe Ang、Chung Ho Ling、Moon Sig Joo、In Seok Yeo (1.Department of Electrical Engineering, National University of Singapore、2.Hyundai Electronics Ind. Co. Ltd., Memory R&D Division)

https://doi.org/10.7567/SSDM.2000.B-6-6