[B-6-6] Gate Oxide Reliability Concern Associated with X-Ray Lithography

Byung Jin Cho, Sun Jung Kim, Chew Hoe Ang, Chung Ho Ling, Moon Sig Joo, In Seok Yeo (1.Department of Electrical Engineering, National University of Singapore, 2.Hyundai Electronics Ind. Co. Ltd., Memory R&D Division)

https://doi.org/10.7567/SSDM.2000.B-6-6