[B-7-2] Chemical Structures of Oxynitrides/Si(100) Interface

H. Kato、K. Takahashi、H. Nohira、N. Tamura、K. Hikazutani、S. Sano、T. Hattori (1.Department of Electrical and Electronic Engineering, Musashi Institute of Technology、2.Process Develop. Dept., Technol. Develop. Div., Semiconductor Group, Fujitsu Ltd.)

https://doi.org/10.7567/SSDM.2000.B-7-2