[B-7-2] Chemical Structures of Oxynitrides/Si(100) Interface

H. Kato, K. Takahashi, H. Nohira, N. Tamura, K. Hikazutani, S. Sano, T. Hattori (1.Department of Electrical and Electronic Engineering, Musashi Institute of Technology, 2.Process Develop. Dept., Technol. Develop. Div., Semiconductor Group, Fujitsu Ltd.)

https://doi.org/10.7567/SSDM.2000.B-7-2