[C-4-2] Pb Content Control in Sputtered PZT Films for FRAM Mass Production

Soichiro Ozawa、Satoru Mihara、Hideyuki Noshiro、Yoshimasa Horii、Mari Shibata、Tomohiro Takamatsu、Moritaka Nakamura、Yutaka Nishioka、Takeshi Masuda、Yusuke Miyaguchi、Noriaki Tani、Koukou Suu、Tatsuya Yamazaki (1.ULSI Engineering Division, FUJITSU LIMITED、2.Institute for Super Materials, ULVAC JAPAN, Ltd.)

https://doi.org/10.7567/SSDM.2000.C-4-2