[C-6-1] Characteristics of Tunneling Nitride Grown by Electron Cyclotron Resonance Nitrogen Plasma Nitridation and Its Application to Low Voltage EEPROM

Kyeong-Sik Min、Kwyro Lee (1.Memory Design Dept. 4, Hyundai Electronics Industries Co., Ltd.、2.Department of Electrical Engineering, Korea Advanced Institute of Science and Technology)

https://doi.org/10.7567/SSDM.2000.C-6-1