[C-9-5] Charging Damage of SOI Wafer Diagnosed by Scanning Maxwell-Stress Microscopy

T. Matsukawa、H. Fujii、S. Kanemaru、M. Nagao、H. Yokoyama、J. Itoh (1.Electrotechnical Laboratory、2.Materials Research Laboratory, Kobe Steel, LTD.)

https://doi.org/10.7567/SSDM.2000.C-9-5