[D-7-2] In-Situ XPS Study of Etch Chemistry of Methane-Based RIBE of InP Using N2

Zhi Jin, Hiroshi Takahashi, Tamotsu Hashizume, Hideki Hasegawa (1.Research Center for Interface Quantum Electronics (RCIQE), Hokkaido University)

https://doi.org/10.7567/SSDM.2000.D-7-2