Influence of Organic Contaminant on Breakdown Characteristics of MOS Capacitors with Thin SiO2

Takenobu Yoshino; Shin Yokoyama; Tsukuru Suzuki; Toshiaki Fujii

doi:https://doi.org/10.7567/SSDM.2000.LE-2-5

2000 International Conference on Solid State Devices and Materials

Aug 29, 2000 - Aug 31, 2000
Sendai International Center, Sendai, Japan

[LE-2-5] Influence of Organic Contaminant on Breakdown Characteristics of MOS Capacitors with Thin SiO2

Takenobu Yoshino, Shin Yokoyama, Tsukuru Suzuki, Toshiaki Fujii (1.Research Center for Nanodevices and Systems, Hiroshima University, 2.EBARA, Co., Ltd.)

https://doi.org/10.7567/SSDM.2000.LE-2-5

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