A Comparative Examination of Polyoxide Films Performance Grown by Conventional Dry Thermal (900℃) or Plasma Assisted (400℃) Oxidation Techniques

Fuminobu Imaizumi; Tatsufumi Hamada; Shigetoshi Sugawa; Herzl Aharoni; Tadahiro Ohmi

doi:https://doi.org/10.7567/SSDM.2001.A-4-4

[A-4-4] A Comparative Examination of Polyoxide Films Performance Grown by Conventional Dry Thermal (900℃) or Plasma Assisted (400℃) Oxidation Techniques

Fuminobu Imaizumi、Tatsufumi Hamada、Shigetoshi Sugawa、Herzl Aharoni、Tadahiro Ohmi (1.Department of Electronic Engineering Graduated school of Engineering, Tohoku University、2.New Industry Creation Hatchery Center, Tohoku University、3.Department of Electrical and Computer Engineering, Ben-Gurion University of the Negev)

https://doi.org/10.7567/SSDM.2001.A-4-4

2001 International Conference on Solid State Devices and Materials

[A-4-4] A Comparative Examination of Polyoxide Films Performance Grown by Conventional Dry Thermal (900℃) or Plasma Assisted (400℃) Oxidation Techniques