[A-5-2] New Charge Control Technology by Stencil Mask Ion Implantation

Takeshi Shibata、Kyoichi Suguro、Kazuyoshi Sugihara、Katsuya Okumura、Tsutomu Nishihashi、Kazuhiro Kashimoto、Junki Fujiyama、Yuzo Sakurada (1.Process & Manufacturing Engineering Center, Semiconductor Company Toshiba Corporation、2.Ion implantation equipment div. 2, ULVAC Japan, Ltd.)

https://doi.org/10.7567/SSDM.2001.A-5-2