[A-5-2] New Charge Control Technology by Stencil Mask Ion Implantation
Takeshi Shibata, Kyoichi Suguro, Kazuyoshi Sugihara, Katsuya Okumura, Tsutomu Nishihashi, Kazuhiro Kashimoto, Junki Fujiyama, Yuzo Sakurada
(1.Process & Manufacturing Engineering Center, Semiconductor Company Toshiba Corporation, 2.Ion implantation equipment div. 2, ULVAC Japan, Ltd.)
https://doi.org/10.7567/SSDM.2001.A-5-2
